Morphology of alkali halide thin films studied by AFM

被引：3

作者：

Golek, F ^{[1
]}

Mazur, P ^{[1
]}

Ryszka, Z ^{[1
]}

Zuber, S ^{[1
]}

机构：

[1] Univ Wroclaw, Inst Expt Phys, PL-50204 Wroclaw, Poland

来源：

SURFACE SCIENCE | 2006年 / 600卷 / 08期

关键词：

alkali halide; growth mechanism; interface; nanofabrication;

D O I：

10.1016/j.susc.2005.12.066

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Thin layers of alkali halides were investigated by atomic force microscope (AFM). The studied systems were: LiBr/KBr(001) with -16.7% misfit, LiF/Si(001) with +4.4% misfit, LiBr/LiF(001) with +36.8% misfit and NaCl/Si(001) with +46.5% misfit. The results show that the surface morphology strongly depends on the temperature of layer formation. The alkali halides deposited on the foreign substrate at elevated temperatures or at room temperature and subsequently annealed form preferentially 3D islands leaving uncovered substrate areas between them. It is suggested that Ostwald ripening takes place at elevated temperatures. (c) 2006 Elsevier B.V. All rights reserved.

引用

页码：1689 / 1696

页数：8

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