CVD Deposited Titania Thin Films for Gas Sensors with Improved Operating Characteristics

被引：13
|
作者：
Baryshnikova, Marina V. [1 ]
Filatov, Leonid A. [1 ]
Petrov, Andrey S. [2 ]
Alexandrov, Sergey E. [1 ]
机构：
[1] Peter Great St Petersburg Polytech Univ, Dept Phys Chem & Microsyst Technol, 29 Polytech Skaya St, St Petersburg 195251, Russia
[2] Mikron JSC, Dept Measurements, 1-Y Zapadny Proezd 12-1, Moscow 124460, Russia
来源：
CHEMICAL VAPOR DEPOSITION | 2015年 / 21卷 / 10-12期
关键词：
Ethanol sensor; Thin film sensor; TiO2; CHEMICAL-VAPOR-DEPOSITION; TIO2; FILMS; ETHANOL; DIOXIDE; BEHAVIOR; MOCVD;
D O I：
10.1002/cvde.201507187
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
This paper describes the results of experimental evaluation of titanium dioxide thin films formed by CVD as active layers in semiconductor, resistive sensors for detection of ethanol vapors. TiO2 layers with a thickness of 90nm are formed by CVD in the TTIP-O-2-O-3-Ar reaction system. Sensors manufactured with titania films formed under all the deposition conditions studied exhibit good electrical response to the ethanol vapors, with quick response-recovery characteristics in the temperature range 170-300 degrees C. Sensor performance is determined by the relative amount of anatase phase and grain size in the films. The response value (Rair/Rethanol) of the sample with the highest degree of crystallinity reached 37 at an operating temperature of 200 degrees C.
引用
收藏
页码：327 / 333
页数：7
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