Design and fabrication of a novel integrated shadow mask for passive matrix OLDE devices

被引：4
|
作者：
Huang, Z. H. [1 ]
Qi, G. J. [1 ]
Zeng, X. T. [1 ]
Lukito, D. [1 ]
Su, W. M. [1 ]
机构：
[1] Singapore Inst Mfg Technol, Singapore 638075, Singapore
来源：
THIN SOLID FILMS | 2009年 / 517卷 / 17期
关键词：
Photolithography; Sol-gel; Integrated shadow mask; OLEDs; INSULATORS; DISPLAY; STACK;
D O I：
10.1016/j.tsf.2009.03.096
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
This paper reports a novel structural design of integrated shadow mask and its fabrication technique by thin film processes. The proposed Gamma-shaped mask structure provides passive matrix OLED devices with a higher aperture ratio than the conventional T-shaped profiled masks. The Gamma-shaped mask structure can be realized with a low cost patternable sol-gel and photolithography processes. Full angle deposition can be realized with the new mask structure, which is important for mass production of devices with automatic systems. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码：5280 / 5283
页数：4
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