Theoretical Approach to Electroresistance in Ferroelectric Tunnel Junctions

被引:26
|
作者
Chang, Sou-Chi [1 ]
Naeemi, Azad [1 ]
Nikonov, Dmitri E. [2 ]
Gruverman, Alexei [3 ]
机构
[1] Georgia Inst Technol, Sch Elect & Comp Engn, Atlanta, GA 30332 USA
[2] Intel Corp, Components Res, Hillsboro, OR 97124 USA
[3] Univ Nebraska, Dept Phys & Astron, Lincoln, NE 68588 USA
来源
PHYSICAL REVIEW APPLIED | 2017年 / 7卷 / 02期
基金
美国国家科学基金会;
关键词
ROOM-TEMPERATURE; THIN-FILMS; MAGNETORESISTANCE; PHYSICS; DEVICES;
D O I
10.1103/PhysRevApplied.7.024005
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this paper, a theoretical approach comprising the nonequilibrium Green's function method for electronic transport and the Landau-Khalatnikov equation for electric polarization dynamics is presented to describe polarization-dependent tunneling electroresistance (TER) in ferroelectric tunnel junctions. Using appropriate contact, interface, and ferroelectric parameters, the measured current-voltage characteristic curves in both inorganic (Co/BaTiO3/La0.67Sr0.33MnO3) and organic (Au/PVDF/W) ferroelectric tunnel junctions can be well described by the proposed approach. Furthermore, under this theoretical framework, the controversy of opposite TER signs observed experimentally by different groups in Co/BaTiO3/La0.67Sr0.33MnO3 systems is addressed by considering the interface termination effects using the effective contact ratio defined through the effective screening length and dielectric response at the metal-ferroelectric interfaces. Finally, our approach is extended to investigate the role of a CoOx buffer layer at the Co/BaTiO3 interface in a ferroelectric tunnel memristor. It is shown that in order to have a significant memristor behavior not only the interface oxygen vacancies but also the CoOx layer thickness may vary with the applied bias.
引用
收藏
页数:12
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