Investigation in the interface roughness of DC-sputtered Mo/B4C multilayer mirrors with variable layer pairs for 7-nm soft X-ray polarizers

被引：4
|
作者：
Wang, Haixia [1 ]
Xu, Dechao [1 ]
Zhu, Jie [1 ]
Zhang, Zhong [1 ]
Alnaimi, Radhwan [2 ]
Mu, Baozhong [1 ]
Wang, Zhanshan [1 ]
Chen, Hong [1 ]
机构：
[1] Tongji Univ, Dept Phys, IPOE, MOE Key Lab Adv Microstruct Mat, Shanghai 200092, Peoples R China
[2] Kings Coll London, Dept Phys, London WC2R 2LS, England
来源：
OPTIK | 2014年 / 125卷 / 14期
关键词：
Multilayer; Roughness; Reflectivity; Scattering; FREE-ELECTRON LASER; 6.7 NM WAVELENGTH; MO-SI; STABILITY; LA/B4C; STRESS; BORON; REFLECTIVITY; LITHOGRAPHY; REFLECTANCE;
D O I：
10.1016/j.ijleo.2014.01.044
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
The surface and interface roughness of Mo/B4C multilayer mirrors for 7-nm soft X-ray polarizer with variable layer pairs (N=50, 70, 90 and 110), fabricated by DC sputtering technique is investigated by atomic force microscopy and X-ray scattering and reflecting. The experimental results present that the surface and interface roughness of Mo/B4C multilayer mirrors increase layer by layer from its substrate as its Mo layer thickness greater than 2nm, and the roughness grown tendency could be characterized by a quadratic function, (C) 2014 Elsevier GmbH. All rights reserved.
引用
收藏
页码：3415 / 3418
页数：4
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