Low energy focused ion beam system design

被引:4
|
作者
Rauscher, Michael [1 ]
Plies, Erich [1 ]
机构
[1] Univ Tubingen, Inst Appl Phys, D-72076 Tubingen, Germany
来源
关键词
DIRECT DEPOSITION; OPTICAL-SYSTEM; COULOMB INTERACTIONS; FABRICATION; SI; EPITAXY; BRIGHTNESS; DAMAGE; PROBE; MODE;
D O I
10.1116/1.2208989
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Focused ion beam (FIB) systems operated at typically 30 keV energy have now reached a remarkable level of sophistication in terms of optical performance. Not unlike the much earlier developments in scanning electron microscopy, there now seems to be a fairly recent trend towards also enhancing the low energy performance of these systems-mainly driven by their possible utilization in transmission electron microscopy sample preparation. However, low energy operation indeed appears to have already been an issue in the very early days of FIB development-although then against the background of potential applications in direct semiconductor device fabrication. In this study, different approaches for generating low energy ion probes are discussed on the basis of. previous and existing FIB systems for which experimental data have been made available. Subsequently, a dedicated low energy focused ion beam column design is introduced, which operates similarly to many modem field emission scanning electron microscopes. The performance of the system is assessed by means of standard aberration-optical calculations as well as by using data from direct ray tracing. The latter also allows the consideration of the impact of mutual Coulomb interactions. (c) 2006 American Vacuum Society.
引用
收藏
页码:1055 / 1066
页数:12
相关论文
共 50 条
  • [41] Maskless selective epitaxy of GaN by Ga low energy focused ion beam and dimethylhydrazine
    Cho, DH
    Tanaka, M
    Pak, K
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (03): : 1461 - 1466
  • [42] THE CHARACTERISTICS OF ION-BEAM-INDUCED SPONTANEOUS ETCHING OF GAAS BY LOW-ENERGY FOCUSED ION-BEAM IRRADIATION
    KOSUGI, T
    YAMASHIRO, T
    AIHARA, R
    GAMO, K
    NAMBA, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (11B): : 3242 - 3245
  • [43] Beam interactions in a focused ion beam system with a liquid metal ion source
    de Jager, P.W.H., 1600, Publ by Elsevier Science Publ Co Inc, New York, NY, United States (23): : 1 - 4
  • [44] Measuring the beam size of a focused ion beam (FIB) system
    Orloff, Jon
    SCANNING MICROSCOPY 2010, 2010, 7729
  • [45] AN AUTOMATIC BEAM POSITIONING SYSTEM FOR LOW ENERGY ION BEAMS
    BROWN, RB
    BOURLAND, PD
    POWERS, D
    NUCLEAR INSTRUMENTS & METHODS, 1969, 72 (02): : 217 - &
  • [46] THE LOW ENERGY RIBBON ION BEAM SOURCE AND TRANSPORT SYSTEM
    Masunov, E. S.
    Polozov, S. M.
    Kulevoy, T., V
    Pershing, V., I
    PROBLEMS OF ATOMIC SCIENCE AND TECHNOLOGY, 2006, (02): : 123 - 125
  • [47] A focused ion beam secondary ion mass spectroscopy system
    Crow, GA
    Christman, L
    Utlaut, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (06): : 2607 - 2612
  • [48] Focused ion beam secondary ion mass spectroscopy system
    Crow, G.A.
    Christman, Locke
    Utlaut, M.
    Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1995, 13 (06):
  • [49] Focused ion beam applications for design and product analysis
    Lange, J.A.
    Czapski, S.
    International Symposium for Testing and Failure Analysis - ISTFA, 1991,
  • [50] An ion beam system for calibration of space low-energy ion detectors
    Guifen, Shi
    Yiren, Li
    Bin, Miao
    Kai, Liu
    Xinjun, Hao
    Zonghao, Pan
    Meng, Guan
    OPEN ASTRONOMY, 2023, 32 (01)