Simultaneous direct UV-writing of channel waveguide and Bragg grating structures

被引:0
|
作者
Emmerson, GD [1 ]
Gawith, CBE [1 ]
Williams, RB [1 ]
Smith, PGR [1 ]
机构
[1] Univ Southampton, Optoelect Res Ctr, Southampton SO17 1BJ, Hants, England
关键词
direct UV writing; direct gating writing; channel waveguides; Bragg gratings; planar lightwave circuits;
D O I
10.1117/12.537944
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Direct UV-writing is an ideal technique for rapid prototyping and small batch fabrication of integrated optical circuits. Based on the refractive index increase of a glass from exposure to a tightly focused UV beam. The translation of this beam relative to a suitable substrate allows the definition of 2-d waveguide structures such as s-bends and power couplers without the need for subsequent processing. Our alternative technique, Direct Grating Writing retains the advantages of Direct UV writing for channel definition but allowing both the grating and channel structure to be formed in the same process. Using this new technique, we present the fabrication of conventional channel waveguides and Bragg channel waveguides. We demonstrate the independence of the Bragg grating strength from the index difference of the channel waveguide, the sensitivity of this process as a characterization technique, and the ability to use this technique to fabricate more complex 2-D structures for integrated optical circuits. We finally present the fabrication of a range of gratings spanning the entire wavelength span commonly used for optical communication with no change in the equipment.
引用
收藏
页码:156 / 167
页数:12
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