MANY-BEAM X-RAY DIFFRACTION FROM SILICON AT EXACT BACKSCATTERING.

被引：0

作者：

Sutter, J. P. ^{[1
,2
]}

Alp, E. E. ^{[3
]}

Bortel, G. ^{[3
]}

Hu, M. Y. ^{[3
]}

Lee, P. ^{[3
]}

Sturhahn, W. ^{[3
]}

Toellner, T. S. ^{[3
]}

Colella, R. ^{[4
]}

Sinn, H. ^{[5
]}

机构：

[1] Purdue Univ, W Lafayette, IN 47907 USA

[2] Argonne Natl Lab, Argonne, IL 60439 USA

[3] Argonne Natl Lab, Adv Photon Source, Argonne, IL 60439 USA

[4] Purdue Univ, Dept Phys, W Lafayette, IN 47907 USA

[5] Univ Rostock, Fachbereich Phys, D-18051 Rostock, Germany

来源：

ACTA CRYSTALLOGRAPHICA A-FOUNDATION AND ADVANCES | 1999年 / 55卷

关键词：

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

P13.14.021

引用

页码：532 / 532

页数：1

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