Synthesis and temperature-dependent local structural and electrical properties of VO2 films

被引:9
|
作者
Jin, Zhenlan
Hwang, In-Hui
Park, Chang-In
Son, Jae-Kuan
Han, Sang-Wook [1 ]
机构
[1] Jeonbuk Chonbuk Natl Univ, Dept Phys Educ, Jeonju 561756, South Korea
基金
新加坡国家研究基金会;
关键词
VO2; Metal insulator transition; XAFS; Structure; Resistivity; METAL-INSULATOR-TRANSITION; X-RAY; THIN-FILMS; PHASE-TRANSITION; MOTT TRANSITION; GROWTH; BAND;
D O I
10.1016/j.cap.2015.11.012
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We examine the local structural and electrical properties of VO2 films showing metal-to-insulator transition (MIT) by using in-situ x-ray absorption fine structure (XAFS) measurements at the V K edge and resistance measurements in the temperature range 20-120 degrees C. VO2 films are synthesized on Al2O3 (0001) substrates by DC magnetron sputtering deposition. X-ray diffraction measurements show that the films have b-oriented monoclinic-phase crystals at room temperature. XAFS measurements reveal a local structural transition in the films from the monoclinic (M-1) to the rutile (R) phase at similar to 70 degrees C during their heating; further, temperature-dependent resistance (ReT) measurements showed a sharp MIT in the films at similar to 75 degrees C. Extended XAFS (EXAFS) measurements reveal non-rigid changes of V-O and V-V bond lengths from the M-1 to the R phase via the M-2 phase. In-situ EXAFS and R-T measurements show that the synthesized VO2 films act as Mott insulators and that their electrical property change is not proportional to their structural property change at their MIT temperature. (C) 2015 Elsevier B.V. All rights reserved.
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页码:183 / 190
页数:8
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