Fabrication of substrates with extended nanostructured surface areas for wetting studies

被引：5

作者：

Pozzato, A. ^{[1
,2
]}

Dal Zilio, S. ^{[1
,2
]}

Bruschi, L. ^{[2
]}

Mistura, G. ^{[2
]}

Tormen, M. ^{[1
]}

机构：

[1] Lilit Beamline, CNR INFM TASC Natl Lab, I-34012 Trieste, Italy

[2] Univ Padua, Dipartimento Fis G Galilei, I-35131 Padua, Italy

来源：

MICROELECTRONIC ENGINEERING | 2009年 / 86卷 / 4-6期

关键词：

Inductively Coupled Plasma (ICP); NIL; Lift-off; Wetting; ADSORPTION;

D O I：

10.1016/j.mee.2008.12.019

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We have developed a fabrication methodology that relies on nanoimprint lithography (NIL), wet etching (Buffered Oxide Etch solution) and plasma etching in an Inductively Coupled Plasma (ICP); with our process we are able to pattern extended surface areas of about 1 cm(2) with an array of rectangular channels or hemispherical holes of nanometric size. The fabricated samples are used in adsorption experiments to test recent theoretical predictions concerning the capillary condensation in capped capillaries. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：1329 / 1332

页数：4

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