Changes in molecular weight distribution caused by main-chain scission of electron beam resists

被引：4
|
作者：
Kozawa, Takahiro [1 ]
Nakajima, Ayako [1 ]
Hoshino, Manabu [2 ]
机构：
[1] Osaka Univ, Inst Sci & Ind Res, Ibaraki, Osaka 5670047, Japan
[2] Zeon Corp, Kawasaki, Kanagawa 2109507, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 2020年 / 59卷 / 12期
关键词：
electron beam lithography; resist; main chain scission; molecular weight distribution; simulation; POLY(METHYL METHACRYLATE); CHEMICAL AMPLIFICATION; ACID DIFFUSION; FABRICATION; LITHOGRAPHY; DEGRADATION; RADIOLYSIS; RESOLUTION; DEVELOPER; LINES;
D O I：
10.35848/1347-4065/abcc12
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Main-chain-scission-type resists have attracted much attention as the next-generation electron beam (EB) resist used for photomask fabrication. In this study, the gel permeation chromatography (GPC) charts of irradiated EB resists (ZEP series of ZEON) were analyzed by simulation to clarify the changes in the molecular weight distribution caused by the main-chain scission of a resist polymer. In the low-exposure-dose region, the molecular weight distribution obtained by GPC was well reproduced by the simulation using a random-scission model. In the high-exposure-dose region, the calculated molecular weight distribution deviated from the experimental one because of crosslinking and the generation of stable components.
引用
收藏
页数：5
相关论文
共 50 条
  • [21] Main-chain benzoxazine oligomers: Effects of molecular weight on the thermal, mechanical, and viscoelastic properties
    Rucigaj, Ales
    Stirn, Ziga
    Sebenik, Urska
    Krajnc, Matjaz
    JOURNAL OF APPLIED POLYMER SCIENCE, 2018, 135 (35)
  • [22] Update on main chain scission resists in Zeon for high-NA EUV lithography
    Shirotori, Akihide
    Oda, Yuji
    Taguchi, Kazunori
    Yeh, Sin Fu
    Suh, Hyo Seon
    De Simone, Danilo.
    Vandenberghe, Geert
    Sanuki, Hideaki
    INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2023, 2023, 12750
  • [23] EFFECT OF SUBSTITUTED METHYL-GROUP ON THE MAIN-CHAIN SCISSION OF ALKYL RADICAL IN SOLID
    ICHIKAWA, T
    RADIATION PHYSICS AND CHEMISTRY, 1992, 40 (02): : 139 - 143
  • [24] INVESTIGATION OF EFFECTS OF MOLECULAR-WEIGHT DISTRIBUTION ON SENSITIVITY OF POSITIVE ELECTRON RESISTS
    LAI, JH
    SHEPHERD, L
    JOURNAL OF APPLIED POLYMER SCIENCE, 1976, 20 (09) : 2367 - 2375
  • [25] Mechanical Properties and Molecular Weight Distribution Changes of Low Density Polyethylene caused by Gamma-Ray and Electron Beam Irradiation
    Miyagawa, Eiichi
    Kanzawa, Takeshi
    Tokumitsu, Katsuhisa
    Tanaka, Akira
    KOBUNSHI RONBUNSHU, 2009, 66 (06) : 202 - 210
  • [26] OBSERVATION OF COUNTERPART RADICAL ON MAIN-CHAIN SCISSION IN PLASMA-IRRADIATED METHACRYLIC POLYMERS
    KUZUYA, M
    SAWADA, K
    TAKAI, T
    NOGUCHI, A
    POLYMER JOURNAL, 1993, 25 (01) : 75 - 81
  • [27] ON THE OXIDATIVE MAIN-CHAIN SCISSION OF NUCLEIC-ACIDS - PULSE-RADIOLYSIS STUDIES
    DENK, O
    SCHNABEL, W
    ZEITSCHRIFT FUR NATURFORSCHUNG C-A JOURNAL OF BIOSCIENCES, 1982, 37 (5-6): : 405 - 412
  • [28] CHEMICAL EVIDENCE FOR MAIN-CHAIN SCISSION AS A MAJOR DECOMPOSITION MODE IN RADIOLYSIS OF SOLID PEPTIDES
    GARRISON, WM
    JAYKO, ME
    WEEKS, BM
    SOKOL, HA
    BENNETTC.W
    JOURNAL OF PHYSICAL CHEMISTRY, 1967, 71 (05): : 1546 - &
  • [29] RADIATION-INDUCED CROSS-LINKING AND CHAIN SCISSION REACTIONS IN CHLORINATED POLYMETHYLSTYRENE ELECTRON-BEAM RESISTS
    JONES, RG
    MATSUBAYASHI, Y
    TATE, PM
    BRAMBLEY, DR
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (09) : 2820 - 2825
  • [30] Influence of developer and development conditions on the behavior of high molecular weight electron beam resists
    Hasko, DG
    Yasin, S
    Mumtaz, A
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (06): : 3441 - 3444
12345