Structural and electrical properties of Bi2(Te0.4Se0.6)3 thin films

被引:3
|
作者
Das, VD [1 ]
Selvaraj, S [1 ]
机构
[1] Indian Inst Technol, Thin Film Lab, Dept Phys, Madras 600036, Tamil Nadu, India
关键词
bismuth tellurium selenium semiconductor polycrystalline thin film; Fermi energy; thermoelectric power;
D O I
10.1016/S0254-0584(99)00165-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Thin films of Bi-2(Te0.4Se0.6)(3) alloy have been hash evaporated on to clean glass plates held at room temperature in a vacuum of 2 x 10(-5) torr. The films are found to be polycrystalline with fine grains. Grain growth and grain re-orientation take place in the film during the annealing process. Grain size of the films is found to increase with the increase of thickness of the films. The annealed films have been used for the size effect studies of electrical resistivity and thermoelectric power. Conduction activation energy is found to be thickness dependent. This is ascribed to the polycrystalline nature of the films. The size effect analysis leads to the evaluation of important physical parameters like mean free path,Fermi energy and exponent of the energy dependent expression for the mean free path. Carrier concentration is calculated using the Fermi energy obtained from the size effect analysis. (C) 2000 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:68 / 74
页数:7
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