Characteristics of Schottky diodes on 6H-SiC surfaces after sacrificial anodic oxidation

被引:0
|
作者
Kato, M [1 ]
Ichimura, M [1 ]
Arai, E [1 ]
机构
[1] Nagoya Inst Technol, Dept Elect & Comp Engn, Showa Ku, Nagoya, Aichi 4668555, Japan
关键词
6H-SiC; AES spectrum; anodic oxidation; contact resistance; sacrificial oxidation; Schottky diodes; surface layer;
D O I
10.4028/www.scientific.net/MSF.389-393.933
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Sacrificial anodic oxidation was performed for 6H-SiC surfaces in order to remove low crystallinity layer. We used an electrolyte of ethylene glycol, water and KNO3 for the anodic oxidation. The anodic films were etched by HF, and then contact metals were evaporated on the oxidized-etched surfaces. Simultaneously, contact metals were also evaporated on as-received surfaces and thermally oxidized-etched surfaces. The comparison of contacts characteristics on each surface shows that the contacts on the anodically oxidized-etched surface have characteristics similar to those on the thermally oxidized-etched surface.
引用
收藏
页码:933 / 936
页数:4
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