Radiation damage on 6H-SiC Schottky diodes

被引:1
|
作者
Nishijima, T
Hearne, SM
Jamieson, DN
Ohshima, T
Lee, KK
Itoh, H
机构
[1] Natl Inst Adv Ind Sci & Technol, Photon Res Inst, Tsukuba, Ibaraki 3058568, Japan
[2] Univ Melbourne, Sch Phys, Microanalyt Res Ctr, Melbourne, Vic 3010, Australia
[3] Japan Atom Energy Res Inst, Takasaki, Gumma 3701292, Japan
关键词
D O I
10.1016/S0168-583X(03)01069-3
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The radiation damage production rate in SiC Schottky diodes was studied by measuring the ion beam induced charge (IBIC) from a 2 MeV He+ ion microbeam. Two 30 mum diameter SiC Schottky diodes with a Ni Schottky contact were fabricated on 5 mum thick epilayers of both n-type and p-type 6H-SiC. An area of 10 mum x 10 mum on each Schottky diode was irradiated by a scanned 2 MeV He+ ion beam focused to less than 1 ltm in diameter with a dose range from 1 x 10(9) to 1 x 10(13) ions/cm(2). Before and after He+ ion beam irradiation, IBIC spectra were measured at the irradiated area. From these spectra, the relationship between the IBIC peak shift and the He+ ion beam dose was measured. For the n-type and p-type diodes, the IBIC pulse height was found to decrease from the initial height by 27% at 7.6 x 10(11) ions/cm(2) irradiation and 29% at 1.1 x 10(11) ions/cm(2), respectively. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:196 / 200
页数:5
相关论文
共 50 条
  • [1] OBIC measurements on 6H-SiC Schottky diodes
    Rottner, K
    Schoner, A
    Frischholz, M
    Helbig, R
    [J]. III-NITRIDE, SIC AND DIAMOND MATERIALS FOR ELECTRONIC DEVICES, 1996, 423 : 51 - 56
  • [2] CVD of tungsten schottky diodes to 6H-SiC
    Lundberg, N
    Tagtstrom, P
    Jansson, U
    Ostling, M
    [J]. SILICON CARBIDE AND RELATED MATERIALS 1995, 1996, 142 : 677 - 680
  • [3] Junction barrier Schottky diodes in 4H-SiC and 6H-SiC
    Dahlquist, F
    Zetterling, CM
    Ostling, M
    Rottner, K
    [J]. SILICON CARBIDE, III-NITRIDES AND RELATED MATERIALS, PTS 1 AND 2, 1998, 264-2 : 1061 - 1064
  • [4] Chemical vapor deposition of tungsten schottky diodes to 6H-SiC
    Lundberg, N
    Ostling, M
    Tagtstrom, P
    Jansson, U
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1996, 143 (05) : 1662 - 1667
  • [5] Schottky barriers on 6H-SiC
    Fröjdh, C
    Thungström, G
    Nilsson, HE
    Petersson, CS
    [J]. PHYSICA SCRIPTA, 1999, T79 : 297 - 302
  • [6] The estimation and revision of barrier heights in 4H-SiC and 6H-SiC Schottky diodes
    Lee, YS
    Kim, DY
    Oh, JK
    Han, MK
    Choi, YI
    [J]. WIDE-BANDGAP SEMICONDUCTORS FOR HIGH POWER, HIGH FREQUENCY AND HIGH TEMPERATURE, 1998, 512 : 175 - 180
  • [7] The guard-ring termination for 6H-SiC Schottky barrier diodes
    Ueno, K
    Urushidani, T
    Hashimoto, K
    Seki, Y
    [J]. SILICON CARBIDE AND RELATED MATERIALS 1995, 1996, 142 : 693 - 696
  • [8] Ni, Al and Ti Schottky diodes and their electrical characterization on 6H-SiC
    Lang, M
    IsaacSmith, T
    Tin, CC
    Williams, JR
    [J]. SILICON CARBIDE AND RELATED MATERIALS 1995, 1996, 142 : 681 - 684
  • [9] Ti Schottky barrier diodes on n-type 6H-SiC
    Liu, ZL
    Wang, SR
    Yu, F
    Zhang, YG
    Zhao, H
    [J]. SOLID-STATE AND INTEGRATED-CIRCUIT TECHNOLOGY, VOLS 1 AND 2, PROCEEDINGS, 2001, : 1183 - 1186
  • [10] ANNEALING OF SCHOTTKY CONTACTS ON 6H-SiC
    Machac, Petr
    Orna, Martin
    Cichon, Stanislav
    [J]. ELECTRONIC DEVICES AND SYSTEMS: IMAPS CS INTERNATIONAL CONFERENCE 2011, 2011, : 29 - 32