MBE growth of "electron-doped" cuprates

被引：0
|
作者：
Naito, M [1 ]
Tsukada, A [1 ]
Krockenberger, Y [1 ]
Karimoto, S [1 ]
Yamamoto, H [1 ]
机构：
[1] NTT Corp, Basic Res Labs, Atsugi, Kanagawa 2430198, Japan
来源：
FRONTIERS IN SUPERCONDUCTING MATERIALS-NEW MATERIALS AND APPLICATIONS | 2004年 / 3卷
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中图分类号：
T [工业技术];
学科分类号：
08 ;
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页码：217 / 219
页数：3
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