In situ high-speed synchrotron X-ray beam profiling and position monitoring

被引:11
|
作者
van Silfhout, R. G.
Manolopoulos, S.
Kyele, N. R.
Decanniere, K.
机构
[1] Univ Manchester, Sch Elect & Elect Engn, Manchester M60 1QD, Lancs, England
[2] Rutherford Appleton Lab, CCLRC, Didcot OX11 0QX, Oxon, England
[3] ESRF, DUBBLE, F-38000 Grenoble, France
[4] Vrije Univ Brussels, Brussels, Belgium
基金
英国工程与自然科学研究理事会;
关键词
X-rays; beam position monitor; beam profile monitor; charge amplifier; detectors;
D O I
10.1016/j.sna.2006.03.012
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
To take advantage of the very low source emittance of third generation radiation sources high-resolution in situ X-ray beam monitors are required in order to keep the X-ray beam focussed and incident on the sample. We present a compact device based on a linear photodiode array. It consists of relatively few diodes that measure the spatially resolved scattered X-rays from a thin polymer foil placed in the beam path. The device is vacuum compatible, inexpensive and radiation hard. The scattered X-rays are incident on a strip of photodiodes that are connected to a dedicated multi-channel charge-sensitive read-out chip. Test experiments performed at the European Synchrotron Radiation Facility (ESRF) show, that even at a relatively low-intensity bending magnet beam line, X-ray beam position and profiles are obtained extremely fast and precise. (c) 2006 Elsevier B.V All rights reserved.
引用
收藏
页码:82 / 87
页数:6
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