Preparation and Performance of Dynamic Friction Polishing Plate for Diamond Film

被引:15
|
作者
Jin, Zhuji [1 ]
Shi, Shuangji [1 ]
Lin, Jiazhi [1 ]
Jin, Lingchao [1 ]
机构
[1] Dalian Univ Technol, Minist Educ, Key Lab Precis & Nontradit Machining Technol, Dalian 116024, Peoples R China
关键词
Alloy; Chemical vapor deposition (CVD); Diamond; Dynamic friction polishing (DFP); Graphitization; MA; Polishing; SPS; Tungsten; CHEMICAL-VAPOR-DEPOSITION; CVD; POWDER;
D O I
10.1080/10426914.2013.852219
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Dynamic friction polishing (DFP) chemical vapor deposition diamond film with high quality and efficiency puts forward a high demand for the polishing plate. Based on the catalysis of metal material on diamond and requirements of DFP technique, three alloy polishing plates are prepared by mechanical alloying method combined with spark plasma sintering technology. The performance of polishing plates is explored through experiments. Phases and microstructures of polishing plates are analyzed using X-ray diffraction (XRD), scanning electron microscope (SEM), and Raman spectroscope. The results demonstrate that, among all materials experimented, the tungsten-based alloy shows the most excellent polishing performance. The removal rate of diamond film is up to 1.5 mu m/min, but the wear rate of polishing plate is only 0.35mm(3)/min. Graphitization of diamond removal mechanism is discussed by detecting and analyzing the experimental results. Also, the feasibility of DFP technique is verified in field of catalytic machining diamond.
引用
收藏
页码:20 / 26
页数:7
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