RHEED and EELS study of Pd/Al bimetallic thin film growth on different α-Al2O3 substrates

被引：3

作者：

Moroz, V ^{[1
]}

Rajs, K ^{[1
]}

Masek, K ^{[1
]}

机构：

[1] Charles Univ, Fac Math & Phys, Dept Elect & Vacuum Phys, CR-18000 Prague 8, Czech Republic

来源：

SURFACE SCIENCE | 2002年 / 507卷

关键词：

electron energy loss spectroscopy (EELS) reflection high-energy electron diffraction (RHEED); growth; palladium; aluminum; aluminum oxide;

D O I：

10.1016/S0039-6028(02)01400-0

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Pd/Al bimetallic thin films were grown by molecular beam epitaxy on single-crystalline of alpha-Al2O3(0001) and (11 (2) over bar0) surfaces. Substrate and deposit crystallographic structures and evolution of deposit lattice parameter during the growth were studied by reflection high-energy electron diffracition. The electron energy loss spectroscopy was used as an auxiliary method for chemical analysis. The bimetallic films were prepared by successive deposition of both Pd and At metals. The structure of Pd and At deposits in early stages of the growth and its dependence on the preparation conditions were studied. Two phases of Pd clusters covered by At overlayer have been found. The formation of Al overlayer strongly influenced the lattice parameter of Pd clusters. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：300 / 304

页数：5

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