Structure and effect of pyrolisis on plasma polymerized polyfuran thin films

被引：0
|
作者：
Kumar, DS [1 ]
机构：
[1] CMS Coll, Dept Phys, George Sudarshan Ctr Phys & Comp Sci, Kottayam 686001, Kerala, India
来源：
JOURNAL OF APPLIED POLYMER SCIENCE | 2000年 / 75卷 / 09期
关键词：
plasma polymerization; annealing; conductivity; activation energy; semiconducting;
D O I：
10.1002/(SICI)1097-4628(20000228)75:9<1176::AID-APP11>3.3.CO;2-G
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
As part of our attempt to make semiconducting polymers from the plasma polymerized polymers, we have polymerized Furan and annealed the polymerized film. under different annealing conditions. It is noted that the current density is increased by one order when the sample is annealed in the presence of air, and in the case of vacuum annealed sample, the current density decreased in comparison with the unannealed sample. The probable reason for this difference is also discussed. Comparative study of the infrared spectra of the monomer and polymer gives some hints regarding the structure of the polymer unit. (C) 2000 John Wiley & Sons, Inc.
引用
收藏
页码：1176 / 1179
页数：4
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