Superhydrophobic Paper by Facile and Fast Atmospheric Pressure Plasma Etching

被引:61
|
作者
Dimitrakellis, Panagiotis [1 ]
Travlos, Anastasios [1 ]
Psycharis, Vassilios P. [1 ]
Gogolides, Evangelos [1 ]
机构
[1] NCSR Demokritos, Inst Nanosci & Nanotechnol, Patriarhou Gregoriou & Neapoleos 27 St, Aghia Paraskevi 15341, Attica, Greece
关键词
atmospheric pressure plasma; dielectric barrier discharges (DBD); plasma etching; superhydrophobic paper; RAY-DIFFRACTION XRD; HYDROPHOBIC COATINGS; CELLULOSE SURFACES; WATER-REPELLENCY; RF PLASMA; FABRICATION; DEPOSITION; FIBER; DEVICES;
D O I
10.1002/ppap.201600069
中图分类号
O59 [应用物理学];
学科分类号
摘要
Superhydrophobic and to some extent oleophobic paper surfaces are prepared using atmospheric pressure plasma etching. A novel dielectric barrier discharge operating in helium-oxygen mixture is used to rapidly etch organic material from paper surface and create hierarchical topography and subsequently a thin fluorocarbon film is deposited to modify the surface energy. The enhancement of surface topography is achieved via the selective removal of organic matter over inorganic calcium carbonate (calcite) fillers that co-exist in paper. The process led to the fabrication of roll-off superhydrophobic paper with water contact angles >150 degrees and hysteresis <10 degrees for all samples treated over 2min with no deterioration of paper quality. Further treatment over 8min resulted also in diiodomethane repellent surfaces.
引用
收藏
页数:8
相关论文
共 50 条
  • [41] Influence of processing parameters on atmospheric pressure plasma etching of polyamide 6 films
    Gao, Zhiqiang
    Peng, Shujing
    Sun, Jie
    Yao, Lan
    Qiu, Yiping
    APPLIED SURFACE SCIENCE, 2009, 255 (17) : 7683 - 7688
  • [42] Experimental investigation of photoresist etching by kHz AC atmospheric pressure plasma jet
    Wang, Lijun
    Zheng, Yashuang
    Wu, Chen
    Jia, Shenli
    APPLIED SURFACE SCIENCE, 2016, 385 : 191 - 198
  • [43] Influence of processing parameters on atmospheric pressure plasma etching of polyvinyl alcohol films
    Peng, Shujing
    Qiu, Yiping
    MATERIALS AND MANUFACTURING, PTS 1 AND 2, 2011, 299-300 : 608 - +
  • [44] Cutting of SiC Wafer by Atmospheric-Pressure Plasma Etching with Wire Electrode
    Sano, Yasuhisa
    Aida, Kohei
    Kato, Takehiro
    Yamamura, Kazuya
    Mimura, Hidekazu
    Matsuyama, Satoshi
    Yamauchi, Kazuto
    SILICON CARBIDE AND RELATED MATERIALS 2011, PTS 1 AND 2, 2012, 717-720 : 865 - +
  • [45] Atmospheric-pressure PECVD coating and plasma chemical etching for continuous processing
    Hopfe, Volkmar
    Sheel, David W.
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2007, 35 (02) : 204 - 214
  • [46] Facile and fast fabrication of superhydrophobic surface on magnesium alloy
    Wang, Zhongwei
    Li, Qing
    She, Zuxin
    Chen, Funan
    Li, Longqin
    Zhang, Xiaoxu
    Zhang, Peng
    APPLIED SURFACE SCIENCE, 2013, 271 : 182 - 192
  • [47] Fabrication of Durably Superhydrophobic Cotton Fabrics by Atmospheric Pressure Plasma Treatment with a Siloxane Precursor
    Yang, Jing
    Pu, Yi
    Miao, Dagang
    Ning, Xin
    POLYMERS, 2018, 10 (04)
  • [48] Hydrophobic and superhydrophobic surfaces fabricated using atmospheric pressure cold plasma technology: A review
    Dimitrakellis, Panagiotis
    Gogolides, Evangelos
    ADVANCES IN COLLOID AND INTERFACE SCIENCE, 2018, 254 : 1 - 21
  • [49] Facile fabrication of a superhydrophobic titanium surface with mechanical durability by chemical etching
    Gao, Xiaojia
    Tong, Wenjian
    Ouyang, Xiaoping
    Wang, Xiufeng
    RSC ADVANCES, 2015, 5 (103) : 84666 - 84672
  • [50] Facile strategy for fabrication of transparent superhydrophobic coatings on the surface of paper
    Tang, Xinde
    Nan, Shiqing
    Wang, Tieshi
    Chen, Ye
    Yu, Faqi
    Zhang, Guangyou
    Pei, Meishan
    RSC ADVANCES, 2013, 3 (36): : 15571 - 15575