Novel Design of Vertical Double-Diffused Metal-Oxide-Semiconductor Transistor for High Electrostatic Discharge Robustness

被引:2
|
作者
Hatasako, Kenichi [1 ]
Yamamoto, Fumitoshi [1 ]
Uenishi, Akio [1 ]
Kuroi, Takashi [1 ]
Maegawa, Shigeto [1 ]
机构
[1] Renesas Technol Corp, Mixed Signal Device Technol Dept, Prod & Technol Unit, Itami, Hyogo 6640005, Japan
关键词
D O I
10.1143/JJAP.48.04C074
中图分类号
O59 [应用物理学];
学科分类号
摘要
[Bipolar]-[complementary metal-oxide-semiconductor transistor (CMOS)]-[double-diffused metal-oxide-semiconductor transistor (DMOS)] [BiC-DMOS] devices are widely used in high-voltage applications. As some applications require high electrostatic discharge (ESD) robustness, we studied the vertical DMOS (VDMOS) transistor to improve ESD robustness. In this paper, we propose a balanced VDMOS (B-VDMOS) transistor. A B-VDMOS transistor is optimized for a cell layout to improve current uniformity after avalanche breakdown by arranging a number of sources. As the B-VDMOS transistor can prevent current concentration, it is not destroyed after avalanche breakdown and acquires a high second breakdown current. Owing to the high second breakdown current, the B-VDMOS transistor can improve ESD robustness by 50% according to the human body model (HBM) test compared with a conventional VDMOS (C-VDMOS) transistor. As the B-VDMOS transistor has high ESD robustness, it can be used in harsh applications and systems. (C) 2009 The Japan Society of Applied Physics
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页数:4
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