Photo-structurable polymer for interlayer single-mode waveguide fabrication by femtosecond laser writing

被引:9
|
作者
Ho Hoai Duc Nguyen [1 ]
Hollenbach, Uwe [1 ]
Pfirrmann, Stefan [2 ]
Ostrzinski, Ute [2 ]
Pfeiffer, Karl [2 ]
Hengsbach, Stefan [1 ]
Mohr, Juergen [1 ]
机构
[1] KIT, IMT, D-76344 Eggenstein Leopoldshafen, Germany
[2] Micro Resist Technol GmbH MRT, Kopenicker Str 325, D-12555 Berlin, Germany
关键词
3D direct laser writing; Two-photon polymerization (2PP); Photopolymer; Waveguide arrays; Fan-in/fan-out; Compact pitch size; REFRACTIVE-INDEX;
D O I
10.1016/j.optmat.2017.01.037
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present the fabrication and characterization of inter-layer single-mode light-guiding structures in a newly developed photo-structurable polymer via femtosecond laser writing. A host-guest polymer system utilizing external diffusion induces permanent and high refractive index modulation. Analyzing the complete curing and the impact of external diffusion on refractive index profile helps optimize the fabrication process. The fabrications of 4 x 2 array interconnect and 3-waveguide core fan-out device involve only a single layer, and need no stacking or alignment effort. The resulting pitch size and crosstalk between single-mode waveguides are 25 gm and 34 dB, respectively. Adding sensitizer into the photopolymer to increase its sensitivity in two-photon polymerization at a writing wavelength of 390 nm reduces the surface roughness of written structures by a factor of seven. (C) 2017 Elsevier B.V. All rights reserved.
引用
收藏
页码:110 / 116
页数:7
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