Formation of Cr-Zr gradient layer by magnetron sputtering and ion mixing

被引：2
|
作者：
Kashkarov, Egor B. [1 ]
Sidelev, Dmitrii, V [1 ]
Rombaeva, Maya R. [1 ]
Kudiiarov, Viktor N. [1 ]
Lomygin, Anton [1 ]
机构：
[1] Natl Res Tomsk Polytech Univ, 30 Av Lenin, Tomsk 634050, Russia
来源：
INTERNATIONAL CONFERENCE ON MODERN TRENDS IN MANUFACTURING TECHNOLOGIES AND EQUIPMENT: MECHANICAL ENGINEERING AND MATERIALS SCIENCE (ICMTMTE 2019) | 2019年 / 298卷
基金：
俄罗斯科学基金会;
关键词：
COATINGS; FILMS; DEPOSITION;
D O I：
10.1051/matecconf/201929800088
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The gradient Cr-Zr layer was formed onto Zr-1Nb substrate by magnetron sputtering of chromium and zirconium targets and ion mixing (Ar+ with 25 keV). The distribution of Cr and Zr elements in the deposited coatings was measured by using a glow discharge optical emission spectroscopy. The optimal ion fluence onto the substrate was 8x10(19) ion/m(2). At higher ion dose, the intensive sputtering of the deposited coating was observed.
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页数：6
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