Effect of annealing temperature on the microstructure and resistivity of Ge2Sb2Te5 films
被引:0
|
作者:
Liu, B
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Res Ctr Funct Semicond Film Engn & Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R ChinaChinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Res Ctr Funct Semicond Film Engn & Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
Liu, B
[1
]
Song, ZT
论文数: 0引用数: 0
h-index: 0
机构:Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Res Ctr Funct Semicond Film Engn & Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
Song, ZT
Feng, SL
论文数: 0引用数: 0
h-index: 0
机构:Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Res Ctr Funct Semicond Film Engn & Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
Feng, SL
Chen, B
论文数: 0引用数: 0
h-index: 0
机构:Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Res Ctr Funct Semicond Film Engn & Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
Chen, B
机构:
[1] Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Res Ctr Funct Semicond Film Engn & Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
[2] Silicon Storage Technol Inc, Sunnyvale, CA 94086 USA
The effect of annealing temperature on crystallization of amorphous Ge2Sb2Te5 films with thickness of 40 nm is studied by TEM and AFM methods. The relationship between microstructure and resistivity of the Ge2Sb2Te5 film is investigated. From the TEM measurements, the grain size of crystallites increases gradually as the annealing temperature increases. When the annealing temperature is too high, voids are formed, which may originate from evaporation of the Ge2Sb2Te5 film at the elevated temperatures, formation of sink, being nucleated by residual vacancies, and surface roughness. The resistivity of the Ge2Sb2Te5 film decreases with the increasing annealing temperature and has slight changes when the temperature is higher than 400degreesC. Phase transitions and scattering of crystallite boundaries may be the major factors affecting the resistivity of the Ge2Sb2Te5 film.
机构:
Ioffe Inst, St Petersburg 194021, RussiaIoffe Inst, St Petersburg 194021, Russia
Fefelov, S. A.
Kazakova, L. P.
论文数: 0引用数: 0
h-index: 0
机构:
Ioffe Inst, St Petersburg 194021, Russia
St Petersburg State Forest Tech Acad, St Petersburg 194021, RussiaIoffe Inst, St Petersburg 194021, Russia
Kazakova, L. P.
Bogoslovskiy, N. A.
论文数: 0引用数: 0
h-index: 0
机构:
Ioffe Inst, St Petersburg 194021, RussiaIoffe Inst, St Petersburg 194021, Russia
Bogoslovskiy, N. A.
Bylev, A. B.
论文数: 0引用数: 0
h-index: 0
机构:
St Petersburg State Forest Tech Acad, St Petersburg 194021, RussiaIoffe Inst, St Petersburg 194021, Russia
Bylev, A. B.
Yakubov, A. O.
论文数: 0引用数: 0
h-index: 0
机构:
Natl Res Univ Elect Technol, Zelenograd 124498, Moscow Oblast, RussiaIoffe Inst, St Petersburg 194021, Russia
机构:
Ningbo Univ, Fac Elect Engn & Comp Sci, Ningbo 315211, Zhejiang, Peoples R China
Key Lab Photoelect Mat & Devices Zhejiang Prov, Ningbo 315211, Zhejiang, Peoples R ChinaNingbo Univ, Fac Elect Engn & Comp Sci, Ningbo 315211, Zhejiang, Peoples R China
Li, Zengguang
Lu, Yegang
论文数: 0引用数: 0
h-index: 0
机构:
Ningbo Univ, Fac Elect Engn & Comp Sci, Ningbo 315211, Zhejiang, Peoples R China
Key Lab Photoelect Mat & Devices Zhejiang Prov, Ningbo 315211, Zhejiang, Peoples R ChinaNingbo Univ, Fac Elect Engn & Comp Sci, Ningbo 315211, Zhejiang, Peoples R China
Lu, Yegang
Ma, Yadong
论文数: 0引用数: 0
h-index: 0
机构:
Ningbo Univ, Fac Elect Engn & Comp Sci, Ningbo 315211, Zhejiang, Peoples R China
Key Lab Photoelect Mat & Devices Zhejiang Prov, Ningbo 315211, Zhejiang, Peoples R ChinaNingbo Univ, Fac Elect Engn & Comp Sci, Ningbo 315211, Zhejiang, Peoples R China
Ma, Yadong
Song, Sannian
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Lab Nanotechnol, Shanghai 200050, Peoples R ChinaNingbo Univ, Fac Elect Engn & Comp Sci, Ningbo 315211, Zhejiang, Peoples R China
Song, Sannian
Shen, Xiang
论文数: 0引用数: 0
h-index: 0
机构:
Key Lab Photoelect Mat & Devices Zhejiang Prov, Ningbo 315211, Zhejiang, Peoples R China
Ningbo Univ, Adv Technol Res Inst, Lab Infrared Mat & Devices, Ningbo 315211, Zhejiang, Peoples R ChinaNingbo Univ, Fac Elect Engn & Comp Sci, Ningbo 315211, Zhejiang, Peoples R China
Shen, Xiang
Wang, Guoxiang
论文数: 0引用数: 0
h-index: 0
机构:
Key Lab Photoelect Mat & Devices Zhejiang Prov, Ningbo 315211, Zhejiang, Peoples R China
Ningbo Univ, Adv Technol Res Inst, Lab Infrared Mat & Devices, Ningbo 315211, Zhejiang, Peoples R ChinaNingbo Univ, Fac Elect Engn & Comp Sci, Ningbo 315211, Zhejiang, Peoples R China
Wang, Guoxiang
Dai, Shixun
论文数: 0引用数: 0
h-index: 0
机构:
Key Lab Photoelect Mat & Devices Zhejiang Prov, Ningbo 315211, Zhejiang, Peoples R China
Ningbo Univ, Adv Technol Res Inst, Lab Infrared Mat & Devices, Ningbo 315211, Zhejiang, Peoples R ChinaNingbo Univ, Fac Elect Engn & Comp Sci, Ningbo 315211, Zhejiang, Peoples R China
Dai, Shixun
Song, Zhitang
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Lab Nanotechnol, Shanghai 200050, Peoples R ChinaNingbo Univ, Fac Elect Engn & Comp Sci, Ningbo 315211, Zhejiang, Peoples R China
Song, Zhitang
2016 INTERNATIONAL WORKSHOP ON INFORMATION DATA STORAGE AND TENTH INTERNATIONAL SYMPOSIUM ON OPTICAL STORAGE,
2016,
9818