Development of a distributed ferromagnetic enhanced inductively coupled plasma source for plasma processing

A low frequency (similar to 100 kHz) distributed ferromagnetic enhanced inductively coupled plasma (FMICP) source with a separate supply of argon and chlorine into the main discharge chamber is proposed in order to obtain a large volume of dense (10(10) - 10(12) cm(-3)) uniform plasma at low pressures (1-100 mTorr). Argon is activated by FMICP sources in U-shaped tubes and diffuses into the main chamber, mixing with chlorine. The Ar/Cl-2 mixture is also activated in the main discharge chamber by vortex alternating electric fields circulating in U-tubes and in the chamber. A separate supply of Ar into the side FMICP sources and Cl-2 directly into the main chamber can significantly enhance the power transfer efficiency into the main discharge chamber to be used for plasma etching of 450 mm wafers.