Growth Mechanism of L10-Ordered FePt Epitaxial Thin Film

被引:0
|
作者
Futamoto, Masaaki [1 ]
Nakamura, Masahiro [1 ]
Shimizu, Tomoki [1 ]
Ohtake, Mitsuru [1 ]
Shimotsu, Teruho [2 ]
机构
[1] Chuo Univ, Fac Sci & Engn, Tokyo 1128551, Japan
[2] Hitachi Power Solut, Hitachinaka, Ibaraki 3128507, Japan
关键词
C-axis; FePt thin film; film morphology; L1(0)-ordered phase; lateral strain; variant structure;
D O I
10.1109/TMAG.2018.2812813
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Atomic-level structures are investigated by high-resolution transmission electron microscopy (TEM) for 10 nm thick L1(0)-FePt thin films formed on MgO(001) substrate prepared under different conditions. TEM observation has shown that the lattice mismatch with MgO(9%) is decreased greatly by an introduction of misfit dislocation and by lattice bending in FePt material and that such disturbance in FePt crystal lattice is limited within a short distance of less than 2 nm from the MgO interface. Crystal lattice expansion in the lateral direction is recognized in an A1-FePt epitaxial film prepared at 200 degrees C through the lattice-level analysis of high-resolution TEM image. The lateral in-plane strain in FePt material associated with several factors, substrate, cap layer, and film morphology, is considered to have given a strong influence in promoting the growth of L1(0)-FePt(001) crystal and enhancing L1(0) ordering.
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页数:4
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