Schottky barrier modulation of a GaTe/graphene heterostructure by interlayer distance and perpendicular electric field

被引:15
|
作者
Li, Hengheng [1 ]
Zhou, Zhongpo [1 ,2 ,3 ]
Zhang, Kelei [1 ]
Wang, Haiying [1 ]
机构
[1] Henan Normal Univ, Sch Phys, Henan Key Lab Photovolta Mat, Xinxiang 453007, Henan, Peoples R China
[2] Wuhan Univ, Key Lab Artificial Micro & Nanostruct, Minist Educ, Wuhan 430072, Hubei, Peoples R China
[3] Wuhan Univ, Sch Phys & Technol, Wuhan 430072, Hubei, Peoples R China
关键词
GaTe; graphene; Schottky barrier; strain; layer-distance; electric field; 2-DIMENSIONAL MATERIALS; GRAPHENE;
D O I
10.1088/1361-6528/ab2d67
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Two-dimensional materials have recently been the focus of extensive research. Graphene-based vertical van der Waals heterostructures are expected to design and fabricate novel electronic and optoelectronic devices. Monolayer gallium telluride is a graphene-like nanosheet synthesized in experiment. Here, the electronic properties of GaTe/graphene heterostructures are investigated under the interlayer coupling and the applied perpendicular electric field. The results show that the electronic properties of GaTe and graphene are preserved, and the energy bandgap of graphene is opened to 13.5 meV in the GaTe/graphene heterostructure. It is found that the n-type Schottky contact is formed in the GaTe/graphene heterostructure, which can be tuned by the interlayer coupling, and the applied electric field. Moreover, a transformation from n-type to p-type Schottky contact is observed when the interlayer distance is smaller than 3.15 angstrom or the applied electric field is larger than 0.05 V angstrom(-1). These properties are fundamental to the design of new Schottky nanodevices based on the GaTe/graphene heterostructure.
引用
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页数:8
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