Atomic structure of the (2√3 x 2√3)R30° of silicene on Ag(111) surface

被引：17

作者：

Enriquez, Hanna ^{[1
]}

Kara, Abdelkader ^{[2
]}

Mayne, Andrew J. ^{[1
]}

Dujardin, Gerald ^{[1
]}

Jamgotchian, Haik ^{[3
]}

Aufray, Bernard ^{[3
]}

Oughaddou, Hamid ^{[1
,4
]}

机构：

[1] Univ Paris 11, ISMO CNRS, Inst Sci Mol Orsay, Batiment 210, F-91405 Orsay, France

[2] Univ Cent Florida, Dept Phys, Orlando, FL 32816 USA

[3] CNRS, CINaM, UPR 7325, F-13288 Marseille 9, France

[4] Batiment Neuville 2, Dept Phys, F-95031 Neuville Sur Oise, France

来源：

3RD INTERNATIONAL MEETING ON SILICENE (IMS-3) | 2014年 / 491卷

关键词：

IMAGES;

D O I：

10.1088/1742-6596/491/1/012004

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The deposition of one monolayer of silicon on a Ag(111) substrate induces the formation of silicene structures exhibiting different ordered phases, including a (2 root 3x2 root 3)R30 degrees, a (4 x 4) and a (root 13x root 13)R13.9 degrees superstructures. In this paper we focus on the (2 root 3x root 3)R30 degrees phase. Using a combination of scanning tunneling microscopy and LEED observations, we show that this phase corresponds to a 11 degrees rotation of the silicene sheet relative to the substrate orientation.

引用

页数：6

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