Atomic structure of the (2√3 x 2√3)R30° of silicene on Ag(111) surface

被引：17
|
作者：
Enriquez, Hanna [1 ]
Kara, Abdelkader [2 ]
Mayne, Andrew J. [1 ]
Dujardin, Gerald [1 ]
Jamgotchian, Haik [3 ]
Aufray, Bernard [3 ]
Oughaddou, Hamid [1 ,4 ]
机构：
[1] Univ Paris 11, ISMO CNRS, Inst Sci Mol Orsay, Batiment 210, F-91405 Orsay, France
[2] Univ Cent Florida, Dept Phys, Orlando, FL 32816 USA
[3] CNRS, CINaM, UPR 7325, F-13288 Marseille 9, France
[4] Batiment Neuville 2, Dept Phys, F-95031 Neuville Sur Oise, France
来源：
3RD INTERNATIONAL MEETING ON SILICENE (IMS-3) | 2014年 / 491卷
关键词：
IMAGES;
D O I：
10.1088/1742-6596/491/1/012004
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The deposition of one monolayer of silicon on a Ag(111) substrate induces the formation of silicene structures exhibiting different ordered phases, including a (2 root 3x2 root 3)R30 degrees, a (4 x 4) and a (root 13x root 13)R13.9 degrees superstructures. In this paper we focus on the (2 root 3x root 3)R30 degrees phase. Using a combination of scanning tunneling microscopy and LEED observations, we show that this phase corresponds to a 11 degrees rotation of the silicene sheet relative to the substrate orientation.
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页数：6
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