Optical properties of nickel thin films deposited by electroless plating

被引：23
|
作者：
Dumont, E [1 ]
Dugnoille, B [1 ]
Petitjean, JP [1 ]
Barigand, M [1 ]
机构：
[1] FAC POLYTECH MONS,SERV CHIM GEN & ELECTROCHIM,B-7000 MONS,BELGIUM
来源：
THIN SOLID FILMS | 1997年 / 301卷 / 1-2期
关键词：
electrochemistry; ellipsometry; nickel; optical properties;
D O I：
10.1016/S0040-6090(97)00026-6
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A nickel thin film is deposited onto a float glass substrate by means of an autocatalytic reducing reaction in a metallizing solution. The growth of this film is monitored in situ using an ellipsometer. By analysing the ellipsometric measurements, the changes in the complex optical index and the thickness of the film over time can be determined. A comparison of the complex optical index obtained from analysis of the experimental results and those predicted by various effective medium theories indicates that the Maxwell-Garnett theory is the best for modelling the optical properties of the nickel layer.
引用
收藏
页码：149 / 153
页数：5
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