Reductive patterning of graphene oxide by vacuum-ultraviolet irradiation in high vacuum

被引：11
|
作者：
Tu, Yudi [1 ]
Ichii, Takashi [1 ]
Khatri, Om Prakash [2 ]
Sugimura, Hiroyuki [1 ]
机构：
[1] Kyoto Univ, Grad Sch Engn, Dept Mat Sci & Engn, Kyoto 6068501, Japan
[2] CSIR, Indian Inst Petr, Div Chem Sci, Dehra Dun 248005, Uttar Pradesh, India
来源：
APPLIED PHYSICS EXPRESS | 2014年 / 7卷 / 07期
关键词：
SELF-ASSEMBLED MONOLAYERS; PROBE FORCE MICROSCOPY; FILMS; LITHOGRAPHY; SHEETS; LAYER;
D O I：
10.7567/APEX.7.075101
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
A dry photoprocess for converting graphene oxide (GO) to reduced GO (rGO) by vacuum-ultraviolet (VUV) irradiation is reported. The rapid reduction of GO was achieved by irradiating a GO sheet in vacuum with 172 nm VUV light at a low power density of 10 mW.cm(-2). This VUV reduction photochemistry was successfully applied to photolithography by which rGO lines could be drawn on a GO microsheet at a submicrometer resolution. This method will be promising for the fabrication of graphene-based microdevices. (C) 2014 The Japan Society of Applied Physics
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页数：4
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