Force-gradient sensitive Kelvin probe force microscopy by dissipative electrostatic force modulation

被引:12
|
作者
Miyahara, Yoichi [1 ]
Grutter, Peter [1 ]
机构
[1] McGill Univ, Dept Phys, 3600 Rue Univ, Montreal, PQ H3A 2T8, Canada
基金
加拿大自然科学与工程研究理事会;
关键词
RESOLUTION; SURFACE;
D O I
10.1063/1.4981937
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report a Kelvin probe force microscopy (KPFM) implementation using the dissipation signal of a frequency modulation atomic force microscopy that is capable of detecting the gradient of electrostatic force rather than electrostatic force. It features a simple implementation and faster scanning as it requires no low frequency modulation. We show that applying a coherent ac voltage with two times the cantilever oscillation frequency induces the dissipation signal proportional to the electrostatic force gradient which depends on the effective dc bias voltage including the contact potential difference. We demonstrate the KPFM images of a MoS2 flake taken with the present method are in quantitative agreement with those taken with the frequency modulated Kelvin probe force microscopy technique. Published by AIP Publishing.
引用
收藏
页数:5
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