Femtosecond-laser ablation of monolayer molybdenum disulfide (MoS2) on sapphire

被引：0

作者：

Solomon, Joel M. ^{[1
]}

Yao, Hsin-Yu ^{[2
]}

Lu, Li-Syuan ^{[3
]}

Chang, Wen-Hao ^{[3
]}

Her, Tsing-Hua ^{[1
]}

机构：

[1] Univ North Carolina Charlotte, Dept Phys & Opt Sci, 9201 Univ City Blvd, Charlotte, NC 28223 USA

[2] Natl Tsing Hua Univ, Dept Phys, 101 Sect 2,Kuang Fu Rd, Hsinchu, Taiwan

[3] Natl Chiao Tung Univ, Dept Electrophys, Hsinchu 30010, Taiwan

来源：

2019 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO) | 2019年

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Single-shot femtosecond laser ablation of monolayer molybdenum disulfide is demonstrated. An ablation threshold was found 0.9 nJ/mu m(2), which is too low for two-photon photoionization alone. We show that surface defects and avalanche ionization are important. (C) 2019 The Author(s)

引用

页数：2

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