Resistive Switching in Pt/Ta2O5/TiN Structure for Nonvolatile Memory Application

被引:0
|
作者
Lin, Jian-Yang [1 ]
Chen, Jyun-Hao [2 ]
机构
[1] Natl Yunlin Univ Sci & Technol, Dept Elect Engn, Touliu 640, Yunlin, Taiwan
[2] Natl Yunlin Univ Sci & Technol, Grad Sch Elect & Optoelect Engn, Yunlin 640, Taiwan
关键词
RESISTANCE; FILMS;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The bipolar resistive switching characteristics of the Ta2O5-based resistive random access memories with a Pt/Ta2O5/TiN structure are investigated in this work. The proposed device exhibits a small set voltage of 0.76 V. The resistance ratio of ON/OFF state has a good stability with the compliance current of 1 mA and 10mA that is useful for the multi-level data storage application. In addition, good endurance larger than 10(5) cycles under pulse switching operation and retention characteristics up to 10(4) s at room temperature have been achieved in this work.
引用
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页码:20 / 23
页数:4
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