Spatially resolved measurements of plasma parameters is a broad-beam ion source

被引:6
|
作者
Flamm, D
Zeuner, M
机构
[1] IOT Innovat Oberflachentechnol GMBH, D-04318 Leipzig, Germany
[2] Inst Oberflachenmodifizierung Leipzig, D-04318 Leipzig, Germany
来源
关键词
ion source; surface modification; Langmuir probe; plasma parameters;
D O I
10.1016/S0257-8972(99)00123-1
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We measured spatially resolved plasma parameters inside the discharge chamber of a broad-beam ion source using the Langmuir-probe technique. Radial profiles of non-uniform charge-carrier densities between 10(10) and 10(11) cm(-3) are detected which depend on discharge current and voltage. The plasma potential is determined as being equal to the anode potential. Two maxima characterize the electron-energy distribution, a low-energy one produced by thermalized electrons and a second maximum of primary electrons accelerated in the filament sheath. The strength of the multipole magnetic field of the ion source strongly affects the spatial charge-carrier distribution. At a small magnetic-field strength the radial carrier-density distribution is more uniform than at a strong one. These different radial charge-carrier densities in the discharge chamber are also reflected in the extracted ion-beam profiles and ion-beam currents. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:1089 / 1092
页数:4
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