Thickness-dependent optical properties of yttrium fluoride ultrathin films in the visible band

被引：1
|
作者：
Shan, Yao [1 ]
Liu, Pian [1 ]
Chen, Yao [1 ]
Tu, Huatian [1 ]
Zhang, Haotian [1 ]
Zheng, Yuxiang [1 ]
Zhang, Rongjun [1 ]
Wang, Songyou [1 ]
Chen, Liangyao [1 ]
机构：
[1] Fudan Univ, Shanghai Engn Res Ctr Ultra Precis Opt Mfg, Key Lab Micro & Nano Photon Struct, Dept Opt Sci & Engn,Minist Educ, Shanghai 200433, Peoples R China
来源：
OPTICAL MATERIALS EXPRESS | 2020年 / 10卷 / 12期
基金：
中国国家自然科学基金;
关键词：
YF3; THIN-FILMS; SPECTROSCOPIC ELLIPSOMETRY; SCANNING ELLIPSOMETER; STRUCTURAL-PROPERTIES; VOID FRACTION; DEPOSITION; INTERFACE; POLARIZER; COATINGS; DESIGN;
D O I：
10.1364/OME.398536
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Yttrium fluoride (YF3) thin films with a thickness range of 10.8-1079.0 nm were prepared by electron beam evaporation. Spectroscopic ellipsometry was used to study the thickness-dependent optical properties of YF3 ultrathin films in the 300-820 nm wavelength range. With increasing thicknesses, the refractive indices of the intrinsic YF3 films increase slightly and approach that of bulk YF3 due to the decrease of void fractions. The effective refractive indices of the YF3 films also increase with increasing thicknesses, due to the surface and interface effects besides the contribution of decrease of void fractions. (C) 2020 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
引用
收藏
页码：3306 / 3314
页数：9
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