Effect of plasma treatment on corrosion-electrochemical behavior of titanium in molten mixture of cesium and sodium chlorides

被引:0
|
作者
Elshina, L. A. [1 ]
Kudyakov, V. Ya. [1 ]
Malkov, V. B. [1 ]
机构
[1] Russian Acad Sci, Inst High Temp Electrochem, Urals Branch, Ekaterinburg 620219, Russia
关键词
FILMS;
D O I
10.1134/S207020510906015X
中图分类号
TF [冶金工业];
学科分类号
0806 ;
摘要
The effect of high-temperature pulsed plasma (HTPP) on the corrosion-electrochemical behavior of titanium in a molten eutectic mixture of cesium and sodium chlorides in an argon atmosphere at temperatures of 790-810 K is studied. Upon the HTPP treatment in an oxygen or helium environment, a modified corrosion-resistant layer with a thickness up to 20 A mu m is formed on the titanium surface and decreases the corrosion rate of titanium in a chloride melt by a factor of 10-16.
引用
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页码:724 / 729
页数:6
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