Electron projection lithography tool development status

被引:11
|
作者
Miura, T [1 ]
机构
[1] Nikon Inc, IC Equipment Div, Dev Dept 3, Kumagaya, Saitama 3608559, Japan
来源
关键词
D O I
10.1116/1.1520576
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In the development of an electron beam projection lithography (EPL) tool, the most important tasks are to develop the high-speed vacuum stage system, reliable vacuum body system, and total control system. Nikon has a. long history of over 22 years in precision stage development for its optical lithography tools as well as over 10 years in electron beam (EB) instrument development such as the EB 60 with NTT. Recently, optical lithography stages have been developed based on air bearing and linear motor technologies. It is desirable and of minimum risk to utilize those technologies for the EPL system in order to shorten the total time period of development, but the requirements for the EB stage, body, and system control are much different from their optical counterparts and much more difficult. In this article development and implementation of the EPL vacuum stage system, vacuum body system, vacuum loader system, and control system are discussed and overviewed. (C) 2002 American Vacuum Society.
引用
收藏
页码:2622 / 2626
页数:5
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