Defect structure in micropillars using x-ray microdiffraction

被引：78
|
作者：
Maass, R. [1 ]
Grolimund, D.
Van Petegem, S.
Willimann, M.
Jensen, M.
Van Swygenhoven, H.
Lehnert, T.
Gijs, M. A. M.
Volkert, C. A.
Lilleodden, E. T.
Schwaiger, R.
机构：
[1] Paul Scherrer Inst, CH-5232 Villigen, Switzerland
[2] Ecole Polytech Fed Lausanne, Inst Microelect & Microsyst, CH-1015 Lausanne, Switzerland
[3] Forschungszentrum Karlsruhe, Inst Mat Forsch 2, D-76021 Karlsruhe, Germany
来源：
APPLIED PHYSICS LETTERS | 2006年 / 89卷 / 15期
关键词：
D O I：
10.1063/1.2358204
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
White beam x-ray microdiffraction is used to investigate the microstructure of micron-sized Si, Au, and Al pillars fabricated by focused ion beam (FIB) machining. Comparison with a Laue pattern obtained from a Si pillar made by reactive ion etching reveals that the FIB damages the Si structure. The Laue reflections obtained from the metallic pillars fabricated by FIB show continuous and discontinuous streakings, demonstrating the presence of strain gradients. (c) 2006 American Institute of Physics.
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页数：3
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