Developments in nanoscience: polyhedral silsesquioxane (POSS)-polymers oligomeric

被引:495
|
作者
Phillips, SH [1 ]
Haddad, TS
Tomczak, SJ
机构
[1] USAF, Res Lab, Edwards AFB, CA 93524 USA
[2] ERC Inc, Edwards AFB, CA 93524 USA
基金
美国国家科学基金会;
关键词
D O I
10.1016/j.cossms.2004.03.002
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This review is intended to cover the more recent advances in both structure-property relationships of polymers incorporating polyhedral oligomeric silsesquioxane(s) (POSS) nanostructured chemicals as well as space-survivability testing of POSS-polymers. The strategy employed for using POSS as building-blocks is discussed in addition to current models and predictions pertaining to the ideal crystallite/aggregate size of the nanocomposite within the polymer matrix to provide maximum mechanical improvements. The oxidation and rapid formation of SiO2 during atomic oxygen testing leads to a passivating layer, and conclusive proof of these phenomena is presented. Also, a brief history of POSS is outlined to help readers understand how they relate to the recent boom in nanotechnology and their position in nanomaterials RD. (C) 2004 Elsevier Ltd. All rights reserved.
引用
收藏
页码:21 / 29
页数:9
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