Alternate monatomic layer sputter deposition of FCT (L10-type) ordered FePt and CoPt films

被引:16
|
作者
Martins, A.
Fantini, M. C. A.
Souza-Neto, N. M.
Ramos, A. Y.
Santos, A. D.
机构
[1] Univ Fed Goias, Inst Fis, BR-74001970 Goiania, Go, Brazil
[2] Univ Sao Paulo, Inst Fis, BR-05315970 Sao Paulo, Brazil
[3] Lab Nacl Luz Sincrotron, BR-13084971 Campinas, Brazil
[4] CNRS, Lab Louis Neel, UPR 5051, F-38042 Grenoble, France
基金
巴西圣保罗研究基金会;
关键词
deposition by sputtering; thin film structure; magnetic properties of monolayers and thin films; superlattices;
D O I
10.1016/j.jmmm.2005.12.005
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
FePt and CoPt alloy films with FCT(001) structural phase were deposited by sputtering. The films were formed by periodically alternating monatomic layers deposition of Fe(Co) and Pt, on MgO(I 0 0) substrates, with and without a Pt buffer layer, at substrate temperatures (T-S) ranging from 200 to 500 degrees C. The X-ray diffraction patterns show the formation of the FCT crystalline structure in FePt films deposited at T-S >= 200 degrees C. Hysteresis measurements, using Vibrating Sample Magnetrometry, show that FePt and CoPt films with predominant FCT(001) phase are perpendicularly magnetized. The long range order parameter S = 0.58 demonstrates the good degree of chemical order in FePt film prepared at T-S = 400 degrees C. The Experimental results demonstrate that the alternate monatomic layer sputter deposition technique is very effective to grow Fe(Co)Pt ordered alloy at moderate T-S. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:152 / 156
页数:5
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