Deposition of Amorphous Carbon Thin Films by Aerosol-Assisted CVD Method

被引：1

作者：

Fadzilah, A. N. ^{[1
,3
]}

Dayana, K. ^{[3
]}

Rusop, M. ^{[2
,3
]}

机构：

[1] Univ Teknol MARA UiTM, Fac Elect Engn, Permatang Pauh 13500, Pulau Pinang, Malaysia

[2] Univ Teknol MARA UiTM, Fac Appl Sci, NANOsciTech Ctr NST, Shah Alam 40450, Selangor, Malaysia

[3] Univ Teknol MARA UiTM, Fac Elect Engn, NANO Elect Ctr NET, Shah Alam 40450, Selangor, Malaysia

来源：

8TH INTERNATIONAL CONFERENCE ON NANOSCIENCE AND NANOTECHNOLOGY 2017 (NANO-SCITECH 2017) | 2018年 / 1963卷

关键词：

Amorphous carbon (a-C); Aerosol-assisted Chemical Vapor Deposition (AACVD); Camphor Oil; DIAMOND-LIKE CARBON;

D O I：

10.1063/1.5036888

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

This paper reports on the deposition of amorphous carbon (a-C) by Aerosol-assisted Chemical Vapor Deposition (AACVD) using natural source of camphor oil as the precursor material. 4 samples were deposited at 4 different deposition flow rate from 15 sccm to 20 sccm, with 5 sccm interval for each sample. The analysis includes the electrical, optical and structural analysis of the data. The a-C structure which came from the manipulation of synthesis parameter was characterized by the solar simulator system, UV-VIS-NIR, Raman spectroscope and AFM. The properties of a-C are highly dependent on the deposition techniques and deposition parameters; hence the influences of gas flow rate were studied.

引用

页数：6

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