Deposition of Amorphous Carbon Thin Films by Aerosol-Assisted CVD Method

被引:1
|
作者
Fadzilah, A. N. [1 ,3 ]
Dayana, K. [3 ]
Rusop, M. [2 ,3 ]
机构
[1] Univ Teknol MARA UiTM, Fac Elect Engn, Permatang Pauh 13500, Pulau Pinang, Malaysia
[2] Univ Teknol MARA UiTM, Fac Appl Sci, NANOsciTech Ctr NST, Shah Alam 40450, Selangor, Malaysia
[3] Univ Teknol MARA UiTM, Fac Elect Engn, NANO Elect Ctr NET, Shah Alam 40450, Selangor, Malaysia
关键词
Amorphous carbon (a-C); Aerosol-assisted Chemical Vapor Deposition (AACVD); Camphor Oil; DIAMOND-LIKE CARBON;
D O I
10.1063/1.5036888
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
This paper reports on the deposition of amorphous carbon (a-C) by Aerosol-assisted Chemical Vapor Deposition (AACVD) using natural source of camphor oil as the precursor material. 4 samples were deposited at 4 different deposition flow rate from 15 sccm to 20 sccm, with 5 sccm interval for each sample. The analysis includes the electrical, optical and structural analysis of the data. The a-C structure which came from the manipulation of synthesis parameter was characterized by the solar simulator system, UV-VIS-NIR, Raman spectroscope and AFM. The properties of a-C are highly dependent on the deposition techniques and deposition parameters; hence the influences of gas flow rate were studied.
引用
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页数:6
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