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- [1] Implementation of phase shift focus monitor under modified illumination MICROPROCESSES AND NANOTECHNOLOGY 2001, DIGEST OF PAPERS, 2001, : 10 - 11
- [2] Simulations and experiments with the phase shift focus monitor OPTICAL MICROLITHOGRAPHY IX, 1996, 2726 : 236 - 243
- [3] Novel in-situ focus monitor technology in attenuated phase shift mask under actual illumination conditions JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS, 2004, 3 (02): : 284 - 292
- [4] Application of phase shift focus monitor in EUVL process control EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY IV, 2013, 8679
- [5] Phase shift focus monitor applications to lithography tool control OPTICAL MICROLITHOGRAPHY X, 1997, 3051 : 225 - 233
- [6] Phase Shift Focus Monitor for OAI and High NA Immersion Scanners METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXVIII, 2014, 9050
- [7] Photolithography system using a combination of modified illumination and phase shift mask Kamon, Kazuya, 1600, (31):
- [8] Linear phase ring illumination monitor JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (06): : 2800 - 2805
- [9] PHOTOLITHOGRAPHY SYSTEM USING A COMBINATION OF MODIFIED ILLUMINATION AND PHASE-SHIFT MASK JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1992, 31 (12B): : 4131 - 4136
- [10] Performance of a phase-shift focus monitor reticle designed for 193-nm use OPTICAL MICROLITHOGRAPHY XII, PTS 1 AND 2, 1999, 3679 : 108 - 115