Implementation of phase shift focus monitor with modified illumination

被引:2
|
作者
Nakao, S [1 ]
Maejima, S [1 ]
Ueno, A [1 ]
Yamashita, S [1 ]
Miyazaki, J [1 ]
Tokui, A [1 ]
Tsujita, K [1 ]
Arimoto, I [1 ]
机构
[1] Mitsubishi Electr Corp, ULSI Dev Ctr, Itami, Hyogo 6648641, Japan
来源
关键词
phase shift focus monitor; modified illumination; asymmetrical beam cutoff; deformation by aberration;
D O I
10.1117/12.474643
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
For the convenience of practical use of phase shift focus monitor (PSFM), which has been developed by T. Brunner, imaging characteristics of PSFM are investigated under modified illumination by optical image calculations and printing experiments. Although the mechanism of pattern shift with focus offset under modified illumination is different from that for conventional high coherent illumination, sufficient sensitivity for precise focus monitoring is predicted by optical image calculations. Also, it is revealed that reduction of NA, i.e., localizing illumination at the peripheral part of pupil is effective to obtain higher sensitivity. By experiments, predicted characteristics are observed and similar sensitivity to that in conventional high coherent illumination is confirmed both for annular and quadrupole illuminations.
引用
收藏
页码:918 / 926
页数:9
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