Design, fabrication and integration of micro/nano-scale photonic crystal devices and plasmonic devices for VLSI photonic integration application

被引:0
|
作者
Lee, El-Hang [1 ,2 ,3 ]
O, B. H. [1 ,2 ,3 ]
Noh, H. S. [1 ]
Song, S. H. [1 ,4 ]
Lee, S. G. [1 ,2 ,3 ]
Park, S. G. [1 ,2 ,3 ]
机构
[1] Inha Univ, OPERA, Inchon 402751, South Korea
[2] Micro Nano Photon Adv Res Ctr M PARC, Inchon, South Korea
[3] Inha Univ, Coll Engn, Sch Informat & Commun Engn, Incheon 402751, South Korea
[4] Hanyang Univ, Dept Phys, Seoul, South Korea
关键词
optical interconnection; photonic integration; nanophotonics; photonic crystal; plasmonic structure;
D O I
10.1117/12.680469
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We present:on the design, fabrication and integration of micro/nano-scale photonic crystal devices and plasmonic optical devices for VLSI photonic integration application. Using photonic crystals, we design and fabricate nanoscale directional couplers, multimode interference devices, power splitters, wavelength splitters, triplexers, filters, and develop their integration and interconnection schemes and technology. Using plasmonic structures, we design and fabricate horizontal directional couplers, vertical directional couplers, and chirped grating plasmonic structures to generate subwavelength lightwaves to be focused onto nano-potonic devices and modules. We examine scientific and technological issues concerning the miniaturization, interconnection, and integration of these nano-scale photonic devices for applications toward functional VLSI integrated circuits and systems.
引用
收藏
页数:7
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