Unravelling the effect of sulfur vacancies on the electronic structure of the MoS2 crystal

被引:40
|
作者
Zhang, Xixia [1 ]
Wang, Shanpeng [1 ]
Lee, Chao-Kuei [2 ,3 ]
Cheng, Cheng-Maw [3 ,4 ]
Lan, Jia-Chi [2 ]
Li, Xinru [5 ]
Qiao, Jie [1 ]
Tao, Xutang [1 ]
机构
[1] Shandong Univ, State Key Lab Crystal Mat, Jinan 250100, Peoples R China
[2] Natl Sun Yat Sen Univ, Dept Photon, Kaohsiung 80424, Taiwan
[3] Natl Sun Yat Sen Univ, Dept Phys, 70 Lienhei Rd, Kaohsiung, Taiwan
[4] Natl Synchrotron Radiat Res Ctr, Hsinchu 300, Taiwan
[5] Shenzhen Univ, Coll Phys & Optoelect Engn, Shenzhen, Peoples R China
基金
中国国家自然科学基金;
关键词
LAYER MOS2; MONOLAYER; TRANSPORT; OXIDATION; RAMAN; BULK;
D O I
10.1039/c9cp07004d
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Molybdenum disulfide (MoS2) is one of the two-dimensional layered semiconductor transition metal dichalcogenides (TMDCs) with great potential in electronics, optoelectronics, and spintronic devices. Sulfur vacancies in MoS(2)are the most prevalent defects. However, the effect of sulfur vacancies on the electronic structure of MoS(2)is still in dispute. Here we experimentally and theoretically investigated the effect of sulfur vacancies in MoS2. The vacancies were intentionally introduced by thermal annealing of MoS(2)crystals in a vacuum environment. Angle-resolved photoemission spectroscopy (ARPES) was used directly to observe the electronic structure of the MoS(2)single crystals. The experimental result distinctly revealed the appearance of an occupied defect state just above the valence band maximum (VBM) and an upward shift of the VBM after creating sulfur vacancies. In addition, density functional theory (DFT) calculations also confirmed the existence of the occupied defect state close to the VBM as well as two deep unoccupied states induced by the sulfur vacancies. Our results provide evidence to contradict that sulfur vacancies indicate the origin of n-type behaviour in MoS2. This work provides a rational strategy for tuning the electronic structures of MoS2.
引用
收藏
页码:21776 / 21783
页数:8
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