Thermionic electron emission from chemical vapor deposition diamond by nanosecond laser heating

被引:1
|
作者
Choi, B. K. [1 ]
Kang, W. P. [1 ]
Davis, I. L. [1 ]
Davidson, J. L. [1 ]
Hu, S. T. [1 ]
Pitz, R. W. [1 ]
机构
[1] Vanderbilt Univ, Sch Engn, Nashville, TN 37235 USA
来源
关键词
D O I
10.1116/1.3077486
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Vacuum thermionic emission behaviors from bare silicon and chemical vapor deposition diamond coated silicon using laser pulse heating are reported. Under vacuum and subjected to a moderate biasing voltage, the bare silicon and diamond coated silicon emitters show pulses of emission current synchronized with the excitations of nanoseconds 532 urn Nd:YAG pulsed laser. The peak emission current increased monotonically with the increased in laser pulse intensity. The Arrhenius plot of the emission current versus laser intensity follows Richardson's thermionic emission equation for the bare silicon emitter. The diamond-coated silicon emitter shows two activation energies: a value same as that of the bare silicon at low laser intensity and transit to a zero value at high laser intensity. 2009 American Vacuum Society. [DOI: 10.1116/1.3077486]
引用
收藏
页码:557 / 561
页数:5
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