Effect of annealing on electrical, structural, and optical properties of sol-gel ITO thin films

被引:36
|
作者
Hammad, Talaat Moussa [1 ]
机构
[1] Brigham Young Univ, Dept Chem & Biochem, Provo, UT 84602 USA
关键词
INDIUM-TIN-OXIDE; SPUTTERED ITO; TRANSPARENT; PERFORMANCES;
D O I
10.1002/pssa.200881781
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Indium tin oxide (ITO) thin films (In/Sn = 90: 10) prepared by the sol-gel dip-coating process on glass substrates, followed by annealing in air in the temperature range 150-550 degrees C were studied. Overall the films structure, surface roughness, and electrical performances are improved, leading to electrical resistivity fifth order of magnitude larger than before annealing and a more compact and crystalline films, translated by a preferential orientation in the (I I I) direction. Besides that, the films are highly transparent in the visible range, where it shows an average transmittance of 92.3% after annealing to 550 degrees C. The allowed direct band gap at temperature range 150-550 degrees C was estimated to be 3.32-4.21 eV, increasing as the annealing temperature also increases. (C) 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
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页码:2128 / 2132
页数:5
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