Matching and monitoring a CD-SEM tool cluster

被引：1
|
作者：
Sicignano, A [1 ]
Nikitin, AV [1 ]
Yeremin, DY [1 ]
Sandy, M [1 ]
Goldburt, ET [1 ]
机构：
[1] Nanometrol LLC, Ardsley Pk Sci & Technol Ctr, Ardsley, NY 10502 USA
来源：
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVI, PTS 1 & 2 | 2002年 / 4689卷
关键词：
CD-SEM metrology; signal to noise ratio; measurement precision; scan non-linearity; pixel value; stability;
D O I：
10.1117/12.473446
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Nanometrology's unique solution to CD-SEM magnification calibration and matching. This utilizes a novel magnification calibration reference material (MCRM) designed and fabricated on an 8" wafer. When used with the proprietary software, it allows one to calibrate and match individual CD-SEMs. CD-SEM behavior can now be quantified in terms of its parameters such as the average magnification in the field of view (FOV), magnification nonlinearity and magnification stability. It is essential to quantify these parameters with a precision of 0.1% or better in order to meet requirements for sub-100nm metrology.
引用
收藏
页码：1171 / 1178
页数：8
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