A model study of capacitive micromachined ultrasonic transducers fabricated using atomic layer deposition process

被引:0
|
作者
Liu, LL [1 ]
Mukdadi, OM [1 ]
Hertzberg, JR [1 ]
Shandas, R [1 ]
机构
[1] Univ Colorado, Dept Mech Engn, Boulder, CO 80309 USA
关键词
capacitive micromachined; ultrasonic transducers; medical imaging; atomic layer deposition; three-dimensional imaging;
D O I
暂无
中图分类号
R318 [生物医学工程];
学科分类号
0831 ;
摘要
In this paper, we present the model study of capacitive micromachined ultrasonic transducers (CMUTs) fabricated by, atomic layer deposition (ALD) technology, which uses a self-limiting binary reaction process to produce ultra-thin membranes. Advantages of ALD include precise control of membrane thickness., lower cost due to a reduction in the number of fabrication steps, the potential to use a large variety of materials., and increased reliability! due to the enhanced surface quality of the membranes. These capabilities promise fabrication of transducers with superior operating characteristics. However, no study has yet documented sensitivity and power requirements for CMUTs created using ALD. We present here a first-order mechanical and equivalent circuit analysis along with a fabrication process to create and characterize CMUTs using ALD. Simulation results show that these systems have the potential for excellent sensitivity and decreased power requirements. Work to test the fabricated elements is currently underway.
引用
收藏
页码:142 / 148
页数:7
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